Ruthenium compounds, process for their preparation, and...

Organic compounds -- part of the class 532-570 series – Organic compounds – Heavy metal containing

Reexamination Certificate

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C427S252000

Reexamination Certificate

active

07045645

ABSTRACT:
Bis(cyclopentadienyl)ruthenium complex havimg a content of at least one member selected from among sodium, potassium, calcium, iron, nickel and zinc of 5 ppm or below; and bis(cyclopentadienyl)ruthenium complex incorporated with 10 to 100 ppm of rhenium The complexes are suitable for metalorganic chemical vapor deposition (MOCVD) and can give ruthenium-containing thin film.

REFERENCES:
patent: 3306917 (1967-02-01), Shapiro et al.
patent: 5770752 (1998-06-01), Kaufmann et al.
patent: 6207232 (2001-03-01), Kadokura
patent: 2001/0036509 (2001-11-01), Kitada et al.
patent: 2001/0050391 (2001-12-01), Matsuno et al.
patent: 2002/0161253 (2002-10-01), Voll et al.
patent: 2001/234347 (2001-08-01), None
patent: 01/42261 (2001-06-01), None
patent: 02/088152 (2002-11-01), None
P.C. Liao, et al., “Characterization of RuO2thin films deposited on Si by metal-organic chemical vapor deposition”, Thin Solid Films, vol. 287, pp. 74-79, 1996.
Tomonori Aoyama, et al., “Chemical vapor deposition of Ru and its application in (Ba, Sr)TiO3capacitors for future dynamic random access memories”, Japanese Journal of Applied Physics, vol. 38, part 1, No. 4B, pp. 2194-2199, 1999.
Kadoshima, et al., Preliminary Manuscript of the 47thLecture of the Japanese Society of Applied Physics, p. 515 2000(with partial English translation).
G.D. Flesch, et al., “Ionization efficiency data and fragmentation mechanisms for ferrocene nickelocene, and ruthenocene”, J.C.S. Dalton, pp. 1102-1105, 1972.

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