Coating processes – Coating by vapor – gas – or smoke
Reexamination Certificate
2004-12-10
2008-09-30
Meeks, Timothy (Department: 1792)
Coating processes
Coating by vapor, gas, or smoke
24, 24, 24, C438S584000, C438S758000, C438S761000
Reexamination Certificate
active
07429402
ABSTRACT:
In one embodiment, a method for depositing a tungsten-containing film on a substrate is provided which includes depositing a barrier layer on the substrate, such as a titanium or tantalum containing barrier layer and depositing a ruthenium layer on the barrier layer. The method further includes depositing a tungsten nucleation layer on the ruthenium layer and depositing a tungsten bulk layer on the tungsten nucleation layer. The barrier layer, the ruthenium layer, the tungsten nucleation layer and the tungsten bulk layer are independently deposited by an ALD process, a CVD process or a PVD process, preferably by an ALD process. In some examples, the substrate is exposed to a soak process prior to depositing a subsequent layer, such as between the deposition of the barrier layer and the ruthenium layer, the ruthenium layer and the tungsten nucleation layer or the tungsten nucleation layer and the tungsten bulk layer.
REFERENCES:
patent: 4389973 (1983-06-01), Suntola et al.
patent: 4413022 (1983-11-01), Suntola et al.
patent: 4486487 (1984-12-01), Suntola et al.
patent: 5306666 (1994-04-01), Izumi et al.
patent: 5372849 (1994-12-01), McCormick et al.
patent: 5374570 (1994-12-01), Nasu et al.
patent: 5526244 (1996-06-01), Bishop
patent: 5711811 (1998-01-01), Suntola et al.
patent: 5804488 (1998-09-01), Shih et al.
patent: 5916365 (1999-06-01), Sherman
patent: 5923056 (1999-07-01), Lee et al.
patent: 5962716 (1999-10-01), Uhlenbrock et al.
patent: 6015590 (2000-01-01), Suntola et al.
patent: 6015917 (2000-01-01), Bhandari et al.
patent: 6042652 (2000-03-01), Hyun et al.
patent: 6063705 (2000-05-01), Vaartstra
patent: 6084302 (2000-07-01), Sandhu et al.
patent: 6114557 (2000-09-01), Uhlenbrock et al.
patent: 6124158 (2000-09-01), Dautartas et al.
patent: 6139700 (2000-10-01), Kang et al.
patent: 6144060 (2000-11-01), Park et al.
patent: 6156382 (2000-12-01), Rajagopalan et al.
patent: 6174809 (2001-01-01), Kang et al.
patent: 6197683 (2001-03-01), Kang et al.
patent: 6200893 (2001-03-01), Sneh
patent: 6203613 (2001-03-01), Gates et al.
patent: 6207302 (2001-03-01), Sugiura et al.
patent: 6207487 (2001-03-01), Kim et al.
patent: 6218298 (2001-04-01), Hoinkis
patent: 6270572 (2001-08-01), Kim et al.
patent: 6284646 (2001-09-01), Leem
patent: 6287965 (2001-09-01), Kang et al.
patent: 6305314 (2001-10-01), Sneh et al.
patent: 6333260 (2001-12-01), Kwon et al.
patent: 6335280 (2002-01-01), Van der Jeugd
patent: 6338991 (2002-01-01), Zhang et al.
patent: 6342277 (2002-01-01), Sherman
patent: 6348376 (2002-02-01), Lim et al.
patent: 6355561 (2002-03-01), Sandhu et al.
patent: 6358829 (2002-03-01), Yoon et al.
patent: 6365502 (2002-04-01), Paranjpe et al.
patent: 6368954 (2002-04-01), Lopatin et al.
patent: 6369430 (2002-04-01), Adetutu et al.
patent: 6372598 (2002-04-01), Kang et al.
patent: 6379748 (2002-04-01), Bhandari et al.
patent: 6391785 (2002-05-01), Satta et al.
patent: 6399491 (2002-06-01), Jeon et al.
patent: 6416577 (2002-07-01), Suntoloa et al.
patent: 6416822 (2002-07-01), Chiang et al.
patent: 6420189 (2002-07-01), Lopatin et al.
patent: 6423619 (2002-07-01), Grant et al.
patent: 6428859 (2002-08-01), Chiang et al.
patent: 6440495 (2002-08-01), Wade et al.
patent: 6447933 (2002-09-01), Wang et al.
patent: 6451119 (2002-09-01), Sneh et al.
patent: 6451695 (2002-09-01), Sneh
patent: 6458701 (2002-10-01), Chae et al.
patent: 6462367 (2002-10-01), Marsh et al.
patent: 6468924 (2002-10-01), Lee et al.
patent: 6475276 (2002-11-01), Elers et al.
patent: 6475910 (2002-11-01), Sneh
patent: 6478872 (2002-11-01), Chae et al.
patent: 6479100 (2002-11-01), Jin et al.
patent: 6482262 (2002-11-01), Elers et al.
patent: 6482733 (2002-11-01), Raaijmakers et al.
patent: 6482740 (2002-11-01), Soininen et al.
patent: 6511539 (2003-01-01), Raaijmakers
patent: 6517616 (2003-02-01), Marsh et al.
patent: 6527855 (2003-03-01), DeLaRosa et al.
patent: 6534395 (2003-03-01), Werkhoven et al.
patent: 6541067 (2003-04-01), Marsh et al.
patent: 6548424 (2003-04-01), Putkonen
patent: 6551929 (2003-04-01), Kori et al.
patent: 6569501 (2003-05-01), Chiang et al.
patent: 6576778 (2003-06-01), Uhlenbrock et al.
patent: 6580111 (2003-06-01), Kim et al.
patent: 6585823 (2003-07-01), Van Wijck
patent: 6596602 (2003-07-01), Iizuka et al.
patent: 6599572 (2003-07-01), Saanila et al.
patent: 6605735 (2003-08-01), Kawano et al.
patent: 6607976 (2003-08-01), Chen et al.
patent: 6610568 (2003-08-01), Marsh et al.
patent: 6617634 (2003-09-01), Marsh et al.
patent: 6620723 (2003-09-01), Byun et al.
patent: 6627995 (2003-09-01), Paranjpe et al.
patent: 6630201 (2003-10-01), Chiang et al.
patent: 6632279 (2003-10-01), Ritala et al.
patent: 6635965 (2003-10-01), Lee et al.
patent: 6660126 (2003-12-01), Nguyen et al.
patent: 6686271 (2004-02-01), Raaijmakers et al.
patent: 6713373 (2004-03-01), Omstead
patent: 6737317 (2004-05-01), Marsh et al.
patent: 6743739 (2004-06-01), Shimamoto et al.
patent: 6744138 (2004-06-01), Marsh
patent: 6780758 (2004-08-01), Derderian et al.
patent: 6790773 (2004-09-01), Drewery et al.
patent: 6800542 (2004-10-01), Kim
patent: 6800937 (2004-10-01), Marsh et al.
patent: 6803272 (2004-10-01), Halliyal et al.
patent: 6887795 (2005-05-01), Soininen et al.
patent: 2001/0000866 (2001-05-01), Sneh et al.
patent: 2001/0002280 (2001-05-01), Sneh
patent: 2001/0006838 (2001-07-01), Won et al.
patent: 2001/0009140 (2001-07-01), Bondestam et al.
patent: 2001/0009695 (2001-07-01), Saanila et al.
patent: 2001/0024387 (2001-09-01), Raaijmakers et al.
patent: 2001/0025979 (2001-10-01), Kim et al.
patent: 2001/0028924 (2001-10-01), Sherman
patent: 2001/0029094 (2001-10-01), Mee-Young et al.
patent: 2001/0034123 (2001-10-01), Jeon et al.
patent: 2001/0041250 (2001-11-01), Werkhoven et al.
patent: 2001/0050039 (2001-12-01), Park et al.
patent: 2001/0054730 (2001-12-01), Kim et al.
patent: 2001/0054769 (2001-12-01), Raaijmakers et al.
patent: 2002/0000587 (2002-01-01), Kim et al.
patent: 2002/0000598 (2002-01-01), Kang et al.
patent: 2002/0004293 (2002-01-01), Soininen et al.
patent: 2002/0007790 (2002-01-01), Park
patent: 2002/0009544 (2002-01-01), McFeely et al.
patent: 2002/0019121 (2002-02-01), Pyo
patent: 2002/0020869 (2002-02-01), Park et al.
patent: 2002/0021544 (2002-02-01), Cho et al.
patent: 2002/0025627 (2002-02-01), Marsh et al.
patent: 2002/0028556 (2002-03-01), Marsh et al.
patent: 2002/0031618 (2002-03-01), Sherman
patent: 2002/0037630 (2002-03-01), Agarwal et al.
patent: 2002/0041931 (2002-04-01), Suntola et al.
patent: 2002/0048635 (2002-04-01), Kim et al.
patent: 2002/0048880 (2002-04-01), Lee
patent: 2002/0052097 (2002-05-01), Park
patent: 2002/0055235 (2002-05-01), Agarwal et al.
patent: 2002/0060363 (2002-05-01), Xi et al.
patent: 2002/0061612 (2002-05-01), Sandhu et al.
patent: 2002/0068458 (2002-06-01), Chiang et al.
patent: 2002/0073924 (2002-06-01), Chiang et al.
patent: 2002/0074577 (2002-06-01), Marsh et al.
patent: 2002/0074588 (2002-06-01), Lee
patent: 2002/0076481 (2002-06-01), Chiang et al.
patent: 2002/0076507 (2002-06-01), Chiang et al.
patent: 2002/0076508 (2002-06-01), Chiang et al.
patent: 2002/0076837 (2002-06-01), Hujanen et al.
patent: 2002/0076881 (2002-06-01), Marsh et al.
patent: 2002/0081381 (2002-06-01), DeLaRosa et al.
patent: 2002/0081844 (2002-06-01), Jeon et al.
patent: 2002/0086111 (2002-07-01), Byun et al.
patent: 2002/0086507 (2002-07-01), Park et al.
patent: 2002/0090829 (2002-07-01), Sandhu et al.
patent: 2002/0094689 (2002-07-01), Park
patent: 2002/0098627 (2002-07-01), Pomarede et al.
patent: 2002/0102810 (2002-08-01), Iizuka et al.
patent: 2002/0104481 (2002-08-01), Chiang et al.
patent: 2002/0105088 (2002-08-01), Yang et al.
patent: 2002/0106536 (2002-08-01), Lee et al.
patent: 2002/0106846 (2002-08-01), Seutter et al.
patent: 2002/0109168 (2002-08-01), Kim et al.
patent: 2002/0117399 (2002-08-01), Chen et al.
patent: 2002/0121241 (2002-09-01), Nguyen et al.
patent: 2002/0121342 (2002-09-01), Nguyen et al.
patent: 2002/0121697 (2002-09-01), Marsh
patent: 2002/0125516 (2002-09-01), Marsh et al.
patent: 2002/0135071 (2002-09-01), Kang et al.
patent: 2002/0144
Chang Mei
Gandikota Srinivas
Ganguli Seshadri
Gelatos Avgerinos V.
Khandelwal Amit
Applied Materials Inc.
Meeks Timothy
Patterson & Sheridan LLP
Stouffer Kelly M
LandOfFree
Ruthenium as an underlayer for tungsten film deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Ruthenium as an underlayer for tungsten film deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ruthenium as an underlayer for tungsten film deposition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3979237