Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2004-06-25
2010-02-23
Levin, Naum B (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000, C705S026640, C700S121000
Reexamination Certificate
active
07669167
ABSTRACT:
A system for generating photomask orders in a specified format includes at least one template or order for entry and storage of photomask order data, wherein the at least one template or order is created based upon requirements of a specified photomask order format. The system includes at least one set of rules corresponding to the at least one template or order, wherein the set of rules includes instructions which insure that a user enter complete information into the at least one template or order as required by the specified order format. A graphical user interface is associated with the at least one template or order, wherein the user can access the at least one template or order to enter photomask order data and create an order in a specified format. A data processing mechanism imports electronic information from external media into the at least one template or order.
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Cahalane Daniel J.
Croke Charles E.
Ridgway Nick
Suttile Edward J.
Amster Rothstein & Ebenstein LLP
Levin Naum B
Photronics, Inc.
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