Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-01-11
2005-01-11
Smith, Matthew (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C705S026640, C705S027200, C700S121000
Reexamination Certificate
active
06842881
ABSTRACT:
The present invention relates generally to a rule based system and method for automatically generating photomask orders in a specified format, and more particularly, relates to software which includes templates in which photomask order data is entered and rules for guiding the user in entering such data and rules for ensuring that such data is entered accurately. The rules and templates implemented in the present invention are organized and stored in a manner which allows for the software to be easily adapted to meet the criteria of any existing standard (e.g., SEMI P10) or proprietary photomask order format now known or hereinafter developed. Additionally, the software of the present invention provides for the ability to generate new photomask orders using templates and/or existing photomask order data.
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Edward Suttile, Charles Croke, and James Morrrison,Behind The Mask: Streamlining The Front-End Reticle Fabrication Process By Improving Mask Ordering, MICRO Magazine, Jun. 2002, p. 1-5.
Photronics, Screenshots from Align Rite system (9 sheets) see attached “Description of AlignRite Screenshots”.
Croke Charles E.
Ridgway Nicolas P
Amster Rothstein & Ebenstein LLP
Levin Naum
Photronics, Inc.
Smith Matthew
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