Rugged metal electrodes for metal-insulator-metal capacitors

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257298, 257304, 257309, 257310, 257311, H01L 21265

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active

060159863

ABSTRACT:
Thin film metal-insulator-metal capacitors having enhanced surface area are formed by a substituting metal for silicon in a preformed electrode geometry. The resulting metal structures are advantageous for high-density DRAM applications since they have good conductivity, enhanced surface area and are compatible with capacitor dielectric materials having high dielectric constant.

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