Rubber photoresist composite and a method for producing a circui

Details Rubber photoresist composite and a method for producing a circui Rubber photoresist composite and a method for producing a circui

1997-04-28

1998-07-21

Huff, Mark F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430311, 430314, 430318, G03C 1695, G03F 7004, G03F 7012

Patent

active

057833591

ABSTRACT:
This invention relates to a rubber photoresist composite which can be applied evenly on a large-sized or square-shaped baseboard and a method for producing a circuit board using thereof. A rubber photoresist composite of this invention comprises a photosensitive agent, a cyclized rubber and a solvent, said solvent including a solvent component having a boiling point ranging from 150.degree. C. to 220.degree. C. The rubber photoresist composite can be applied evenly on the baseboard rotated at a high speed by a spinner.

REFERENCES:
patent: 3887373 (1975-06-01), Hays et al.
patent: 4525523 (1985-06-01), Nakamura et al.
patent: 5250392 (1993-10-01), Marcotte, Jr. et al.

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