Optics: measuring and testing – Surface roughness
Reexamination Certificate
2008-01-09
2010-06-08
Pham, Hoa Q (Department: 2886)
Optics: measuring and testing
Surface roughness
C356S445000
Reexamination Certificate
active
07733502
ABSTRACT:
A roughness evaluation method for evaluating a roughness of lines formed on a substrate includes a measuring step of irradiating light onto a plurality of locations of the substrate and measuring a state of reflected light by a scatterometry; and an analyzing step of evaluating the roughness of the lines based on a variation in value measured in the measuring step. A roughness evaluation system includes an optical device for irradiating light onto the substrate and measuring a state of reflected light by a scatterometry; a moving device for moving the substrate in at least one of an x-direction and a y-directions on a horizontal plane; a controller for controlling the moving device such that the optical device measures a plurality of locations on the substrate; and an analysis unit for evaluating the roughness based on a variation in measured values at the plurality of locations on the substrate.
REFERENCES:
patent: 2004/0260420 (2004-12-01), Ohno et al.
patent: 2005/0195413 (2005-09-01), Brill
patent: 2006/0072807 (2006-04-01), Bultman et al.
Moriya Machi
Moriya Tsuyoshi
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Pham Hoa Q
Tokyo Electron Limited
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