Rotating sputtering magnetron

Details Rotating sputtering magnetron Rotating sputtering magnetron

2007-02-27

2007-02-27

McDonald, Rodney G. (Department: 1753)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C204S192120, C204S298190, C204S298200, C335S296000, C335S302000, C335S306000

Reexamination Certificate

active

10982616

ABSTRACT:
The magnet arrangement and resulting rotating sputtering magnetron design of an embodiment provides magnetic flux density and distribution to penetrate thick production ferrous targets. Further, the magnetic field shape improves target life by more uniformly removing target material.

REFERENCES:
patent: 4927513 (1990-05-01), Schultheiss et al.
patent: 5399252 (1995-03-01), Scherer et al.
patent: 5746897 (1998-05-01), Heimanson et al.
patent: 5762766 (1998-06-01), Kurita et al.
patent: 5865970 (1999-02-01), Stelter
patent: 6228235 (2001-05-01), Tepman et al.
patent: 6258217 (2001-07-01), Richards et al.
patent: 6491801 (2002-12-01), Gung
patent: 60-116774 (1985-06-01), None
patent: 62-89864 (1987-04-01), None
patent: 03-183123 (1991-08-01), None
PCT Search report and PCT Written Opinion dated Mar. 8, 2006 (All art cited therein has already been cited by U.S. examiner in the 1st OA.).

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