Rotating magnetron cathode and method for the use thereof

Details Rotating magnetron cathode and method for the use thereof Rotating magnetron cathode and method for the use thereof

1991-11-01

1993-06-01

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429811, 20429822, 20429823, C23C 1435

Patent

active

052156389

ABSTRACT:
Tubular target (1) has a magnet system (2) provided in the cavity (H) formed by the target (1) for the formation of a first plasma (6) for the coating of planar substrates (4) which are movable past the cathode (3), by means of a cathode sputtering process. A second plasma (9) is produced by a second magnet system (7) in the cavity (H) in an area between the cathode (3) and a plate (10) opposite the substrate (4).

REFERENCES:
patent: 4417968 (1983-11-01), McKelvey
patent: 4434037 (1984-02-01), Crank

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