Rotating furnace tube having a non-rotating slidable work holder

Details Rotating furnace tube having a non-rotating slidable work holder Rotating furnace tube having a non-rotating slidable work holder

1992-03-19

1993-10-19

Chaudhuri, Olik

Coating apparatus

Gas or vapor deposition

With treating means

118730, 118421, 118416, 432117, B08B 304, B05D 724

Patent

active

052541720

ABSTRACT:
An semiconductor substrate processing apparatus of the type including a furnace tube associated with a fluid supply unit and a fluid discharge unit, wherein the furnace tube is rotatably supported by pairs of confronting rollers and rotated by a motor under the control of a controller in order to achieve various kinds of processing of semiconductor substrates within the furnace tube. With this rotatable furnace tube, the apparatus exhibits high radial temperature uniformity and is able to prevent deformation of the furnace tube.

REFERENCES:
patent: 3836324 (1974-09-01), Shaefer et al.
patent: 3858553 (1975-01-01), Scheel
patent: 4063529 (1977-12-01), Bochkarev et al.
patent: 4077416 (1978-03-01), Johnson, Jr. et al.
patent: 4629500 (1986-12-01), Janz et al.
patent: 4941822 (1990-07-01), Evans et al.
patent: 5073412 (1991-12-01), Gaier

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