Rotatable magnetron including a replacement target structure

Details Rotatable magnetron including a replacement target structure Rotatable magnetron including a replacement target structure

1994-08-25

1995-08-29

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429821, 20429822, 20429823, C23C 1435

Patent

active

054457211

ABSTRACT:
An improved rotatable magnetron enabling efficient removal and replacement of a target structure, having axially movable structures including at least one spindle, which may be extended to engage or retracted to disengage the target structure, and means for extending into a magnet structure within the target structure to selectively fix a rotational position of the magnet structure, and preferably having water and vacuum seals integrated into cartridges which are disposed between spindles and seal housings of the improved rotatable magnetron.

REFERENCES:
patent: 4445997 (1984-05-01), McKelvey
patent: 4466877 (1984-08-01), McKelvey
patent: 5096562 (1992-03-01), Boozenny et al.
patent: 5100527 (1992-03-01), Stevenson et al.
patent: 5200049 (1993-04-01), Stevenson et al.

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