Rotary substrate holder of molecular beam epitaxy apparatus

Details Rotary substrate holder of molecular beam epitaxy apparatus Rotary substrate holder of molecular beam epitaxy apparatus

1985-02-27

1986-04-08

Plantz, Bernard F.

Coating apparatus

Work holders, or handling devices

118725, 118730, 156DIG103, B05C 1300

Patent

active

045805229

ABSTRACT:
A rotary substrate holder of a molecular beam epitaxy apparatus including leads-cum-posts serving both as leads for passing a current to a heater for heating a substrate and as posts for supporting the heater. By this arrangement, heat transferred from the heater to a bearing disposed in the vicinity of the heater is minimized in amount, thereby prolonging the service life of the holder and minimizing a heat loss thereof.

REFERENCES:
patent: 2398382 (1946-04-01), Lyon
patent: 3424628 (1969-01-01), Winings
patent: 3751310 (1973-08-01), Cho
patent: 3824955 (1974-07-01), Marks et al.
patent: 4181544 (1980-01-01), Cho
patent: 4201152 (1980-05-01), Luscher
patent: 4207836 (1980-06-01), Nonaka
patent: 4514250 (1985-04-01), Hwang
Bauer, "Obtaining an Oxide-Free Interface in VIA Connections", IBM Tech. Disclosure Bulletin, vol. 20, No. 2, Jul. 1977, pp. 574-576.

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