Robust filament assembly for a hot-wire chemical vapor...

Details Robust filament assembly for a hot-wire chemical vapor... Robust filament assembly for a hot-wire chemical vapor...

2007-05-17

2010-06-01

Meeks, Timothy H (Department: 1792)

Coating processes

Coating by vapor, gas, or smoke

Carbon or carbide coating

C118S718000

Reexamination Certificate

active

07727590

ABSTRACT:
A hot wire chemical vapor deposition apparatus comprises a vacuum chamber, a substrate support member located in the vacuum chamber, a filament assembly support member located in the vacuum chamber, a precursor gas inlet located in the vacuum chamber and a device for providing a clean portion of at least one filament inside the vacuum chamber without breaking vacuum.

REFERENCES:
patent: 5147826 (1992-09-01), Liu et al.
patent: 5888591 (1999-03-01), Gleason et al.
patent: 2001/0002324 (2001-05-01), Maekawa et al.
patent: 2001/0031541 (2001-10-01), Madan et al.
patent: 2002/0189545 (2002-12-01), Matsumura et al.
patent: 2004/0182600 (2004-09-01), Kawabata et al.
patent: 2006/0108688 (2006-05-01), Richardson et al.
patent: 2008/0050523 (2008-02-01), Kitazoe et al.
patent: PCT/JP05/05566 (2005-10-01), None
Keshner et al., “Study of Potential Cost Reductions Resulting from Super-Large-Scale Manufacturing of PV Modules,” NREL Report for Subcontract No. ADJ-3-33631-01, 2004, two pages.
Makihira et al., “Enhanced nucleation in solid-phase crystallization of amorphous Si by imprint technology,” Applied Physics Letters, Jun. 19, 2000, 76(25):3774-3776.
Mason, Maribeth Swiatek, “Synthesis of Large-Grained Polycrystalline Silicon by Hot-Wire Chemical Vapor Deposition for Thin Film Photovoltaic Applications,” Ph.D. Thesis, California Institute of Technology, 2004, 89 pages.
Rath, J.K., “Low temperature polycrystalline silicon: a review on deposition, physical properties and solar cell applications,” Solar Energy Materials and Solar Cells, Apr. 1, 2003, 76(4):431-487.
Schropp et al., “Poly-silicon films with low impurity concentration made by hot wire chemical vapour deposition,” Solar Energy Materials and Solar Cells, Issues 1-4, Jan. 2001, pp. 541-547.
Wolf et al.,Silicon Processing for the VLSI Era, vol. 1, “Process Technology,”, 1986, pp. 137-138.

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