Robotically loaded epitaxial deposition apparatus

Details Robotically loaded epitaxial deposition apparatus Robotically loaded epitaxial deposition apparatus

1989-05-19

1992-05-26

Bucci, David A.

Material or article handling

Apparatus for charging a load holding or supporting element...

With simultaneous charging and discharging of plural load...

414217, 414416, 269 46, 118725, 118730, C23C 1600

Patent

active

051161818

ABSTRACT:
A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.

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patent: 4928626 (1990-05-01), Carlson et al.
patent: 5038711 (1991-08-01), Dan et al.

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