Robot for and method of transporting semiconductor wafers

Details Robot for and method of transporting semiconductor wafers Robot for and method of transporting semiconductor wafers

1998-02-05

2000-07-04

Lamb, Brenda Adele

Coating apparatus

With heat exchange, drying, or non-coating gas or vapor...

118315, 118423, B05C 1100

Patent

active

060833203

ABSTRACT:
A robot for transporting a plurality of wafers from one processing station to another in a batch-type semiconductor device manufacturing process includes a chuck for holding wafers, a spray nozzle for spraying inert gas on the wafers in order to cover them and thereby prevent their contact with the surrounding air, and a supply line for connecting the spray nozzle and an inert gas supply source. The spray nozzle has a plurality of spray openings spaced apart at uniform intervals. The inert gas is sprayed over the wafers from a nozzle that moves with the robot, thereby creating an inert gas environment around the wafers. Accordingly, as the robot moves, water or other particles adhering to the wafers do not contact the surrounding air moving relative thereto. Hence, marks are prevented from being produced on the wafers.

REFERENCES:
patent: 4286541 (1981-09-01), Blackwood
patent: 4708629 (1987-11-01), Kasamatsu
patent: 5769947 (1998-06-01), Krappweis

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