Rinsing fluid for lithography

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...

Reexamination Certificate

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Details

C429S307000, C429S336000, C430S319000, C430S324000, C430S327000, C430S331000, C522S025000, C526S220000

Reexamination Certificate

active

07741260

ABSTRACT:
The invention provides a novel rinsing fluid which can convert an easily wettable resist pattern surface having a contact angle of 40° or below into one having a contact angle of 70° or above to inhibit pattern collapse effectively and thereby give high-quality products. The rinsing fluid consists of a solution containing at least one fluorine compound soluble in water or alcoholic solvents which is selected from among compounds represented by the general formula (I),those represented by the general formula (II),and those represented by the general formula: Rf′—COOH: wherein R1and R2are each optionally substituted C1-5alkyl whose hydrogen atoms are partially or wholly replaced by fluorine, or R1and R2together with the SO2groups to which they are bonded and the nitrogen atom may form a five- or six-membered ring; Rfis optionally substituted C1-5alkyl whose hydrogen atoms are partially or wholly replaced by fluorine; m and n are each an integer of 2 or 3; and Rf′ is at least partially fluorinated alkyl having 8 to 20 carbon atoms.

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