Rinse melt for LPE crystals

Details Rinse melt for LPE crystals Rinse melt for LPE crystals

1978-10-25

1981-06-16

Bernstein, Hiram

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156DIG63, C30B 1902

Patent

active

042736099

ABSTRACT:
A rinse process for solvating adhered primary melt residue from magnetic garnet crystals grown via liquid phase epitaxial (LPE) techniques. The rinse melt consists of a mixture having a saturation to nucleation temperature range that encompasses the primary melt's growth temperature and a solvent compound different from that used in the primary melt, which will solvate the solvent used in the primary melt and will not produce undesirable rinse melt adhesion.

REFERENCES:
patent: 3050407 (1962-08-01), Nielsen
patent: 3079240 (1963-02-01), Remeika
patent: 3447976 (1969-06-01), Faust, Jr. et al.
patent: 3486937 (1969-12-01), Linares
IEEE Transactions, vol. Mag.-9, No. 3, Sep. 1973, pp. 366-372, Hewitt et al.
Journal of Crystal Growth 18 (1973) pp. 294-296, Robertson.

Affiliated with

Also associated with

Rating

Rinse melt for LPE crystals does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Rinse melt for LPE crystals, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Rinse melt for LPE crystals will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-153772