RF plasma supply device

Details RF plasma supply device RF plasma supply device

2006-10-16

2010-06-29

Paladini, Albert W (Department: 2836)

Electrical transmission or interconnection systems

Plural supply circuits or sources

One source floats across or compensates for other source

Reexamination Certificate

active

07745955

ABSTRACT:
The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.

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