Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1998-04-06
1999-12-07
Bettendorf, Justin P.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31323131, 118723I, 156345, H05H 146
Patent
active
059989335
ABSTRACT:
The present invention pertains to RF (radio frequency) inductive coupling plasma (ICP) inductors having an actual primary winding (powered directly by an RF source) wound around a closed ferrite core, and a virtual closed secondary winding formed around this ferrite core in a plasma contained within a discharge chamber. The present invention enables one to maintain a uniform plasma with no limitation in process sizes and assumes a variety of embodiments. The simplest is merely an annular ferrite core having a primary winding (a few turns) which is placed into the discharge chamber filled with a necessary gas. The plasma sources based on the present invention can be applied in plasma processing technology: etching, deposition, ion implantation, abatement, etc. in plasma devices from ten Watts to a few kW, at an operating frequency from 100 kHz to a few MHZ, and at linear sizes from a few centimeters to a few meters.
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patent: 5560776 (1996-10-01), Sugai et al.
patent: 5591493 (1997-01-01), Paranjpe et al.
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