Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1993-07-30
1995-07-04
Pascal, Robert J.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511141, 31511151, 31511181, 31323131, H01J 724
Patent
active
054303559
ABSTRACT:
Plasma generator (10) includes chamber (14) for containing the plasma source and a plurality of coils (12) located inside of chamber (14). Located external to chamber (14) are a plurality of permanent multipolar magnets (34) operable to establish a magnetic field in the plasma source along the surface of chamber (14) and a set of electromagnets (36) located outside of chamber (14), which define a preferred propagation direction for a whistler wave in chamber (14). Coils (12) resonantly inductive couple RF power to the whistler wave so as to transfer a sufficient amount of energy to the plasma source to induce a plasma state in the plasma source. Coils (12) also generate time varying electromagnetic fields which also sustain the plasma state in the plasma source.
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Donaldson Richard L.
Hiller William E.
Pascal Robert J.
Ratliff Reginald A.
Sorensen Douglas A.
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