Rework process for photoresist film

Details Rework process for photoresist film Rework process for photoresist film

2006-11-09

2009-12-29

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

C430S270100, C430S272100, C430S311000, C430S312000, C430S317000

Reexamination Certificate

active

07638268

ABSTRACT:
There is disclosed a rework process for a photoresist film over a substrate having at least a first antireflection silicone resin film and the photoresist film over the first silicone resin film comprising: at leastremoving the photoresist film with a solvent while leaving the first silicone resin film unremoved;forming a second antireflection silicone resin film over the first silicone resin film; andforming a photoresist film again over the second silicone resin film. There can be provided a rework process for a photoresist film that can be conducted more easily at lower cost and provide more certainly an excellent resist pattern.

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