Rework of polymeric dielectric electrical interconnect by laser

Details Rework of polymeric dielectric electrical interconnect by laser Rework of polymeric dielectric electrical interconnect by laser

1992-11-06

1993-08-17

Hearn, Brian E.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156644, 437173, H01L 21306, H01L 2126

Patent

active

052365514

ABSTRACT:
A metal/polymeric dielectric substrate has metal conductors selectively disconnected by photoablating the polymeric dielectric with an excimer laser, etching the exposed metal using the polymeric dielectric as a mask, and coating an additional layer of polymeric dielectric. This eliminates the need for depositing and removing a separate photoablatable mask. Siloxane-modified-polyimide is a preferred photoablatable polymeric material and copper is a preferred metal.

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patent: 4795720 (1989-01-01), Kawanabe et al.
patent: 4897153 (1990-01-01), Cole
patent: 4965702 (1990-10-01), Lott et al.
D. B. Tuckerman et al., "Laser Planarization", Solid State Technology, Apr. 1986, pp. 129-134.
IBM Technical Disclosure Bulletin, vol. 27, No. 10A, Mar. 1985, pp. 5764-5765, "Wet Etching for Line Deletion and Short Repair on Ceramic Substrates".

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