Reverse etching of chromium

Details Reverse etching of chromium Reverse etching of chromium

1983-04-11

1983-12-20

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156650, 156656, 1566591, 204192EC, 204192E, 252 791, 252 792, 427 38, 430313, 430318, C23F 102, B44C 122, C03C 1500, C03C 2506

Patent

active

044215932

ABSTRACT:
A process for reverse etching a layer of chromium on a substrate is provided wherein a layer of resist is formed on the chromium and developed, thus exposing a portion of the chromium. The exposed chromium is passivated by backscattering from a suitable backing plate in a plasma, the resist is removed and the unpassivated chromium etched with a conventional liquid etchant. The pattern formed in the chromium layer is the opposite of that original formed in the resist material.

REFERENCES:
patent: 3640812 (1972-02-01), Vossen, Jr. et al.
patent: 3692655 (1972-09-01), Vossen, Jr.
Yamazaki et al., Japanese Journal of Applied Physics, vol. 19, No. 7, Jul. 1980, pp. 1371-1376.
Vossen et al., Pure and Appl. Chem., vol. 52, pp. 1759-1765, (1980).
Busta et al., Industrial Research and Development, Jun. 1978, pp. 133-142.

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