Retractable probe system with in situ fabrication environment pr

Details Retractable probe system with in situ fabrication environment pr Retractable probe system with in situ fabrication environment pr

1997-01-22

1998-02-10

Breneman, R. Bruce

Semiconductor device manufacturing: process

With measuring or testing

Electrical characteristic sensed

20429803, 20429832, 216 61, 156345, 324754, G01N 2700, H01L 2100

Patent

active

057168784

ABSTRACT:
A retractable probe system (12) senses in situ a plurality of predetermined process parameters of a wafer (24) fabrication environment (16) and includes a sensing device (47) for sensing the predetermined process parameters, a probe arm (46) for holding sensing device (47) and having sufficient length to extend sensing device (47) into a predetermined location of the fabrication environment (16). A housing (36) receives the sensing device (47) and probe arm (46). A locator mechanism (52, 42, and 44) controllably locates sensing device 47) and probe arm (46) within fabrication environment (16) and within housing (36). An isolator mechanism (34) isolates sensing device (47) and probe arm (46) within housing (36) and essentially out of gases communication with fabrication environment (16). Cleaning mechanism (54) cleanses sensing device (47) within housing (36) and permits sensing device (47) to be immediately thereafter located in fabrication environment (16).

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patent: 5433813 (1995-07-01), Kuwabara

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