Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1987-08-28
1989-10-10
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430191, 430192, 430314, 430323, 430326, 156643, 437228, 437229, G03F 726, H01L 21312
Patent
active
048731765
ABSTRACT:
The invention provides a method for forming a photoresist mask on a substrate resistant to reticulation during plasma etching. The method comprises the steps of forming an imaged and developed photoresist coating over an integrated circuit substrate where the photoresist contains an essentially unreacted acid activated cross linking agent, and subjecting said substrate to an etching plasma in a gaseous stream that contains a Lewis acid. Contact of the surface of the photoresist film with the Lewis acid causes cross linking of the surface of the photoresist film during plasma etching with the formation of a reticulation resistant surface layer.
REFERENCES:
patent: 4259430 (1981-03-01), Kaplan et al.
patent: 4387013 (1983-06-01), Lehmann et al.
patent: 4468284 (1984-08-01), Nelson
patent: 4524121 (1985-06-01), Gleim et al.
patent: 4581321 (1986-04-01), Stahlhofen
patent: 4596763 (1986-06-01), DiCarlo et al.
patent: 4600683 (1986-07-01), Greco et al.
patent: 4600686 (1986-07-01), Meyer et al.
patent: 4690838 (1987-09-01), Hiroaka et al.
Anon, Research Disclosure, #279, 7/1987.
Kalter, H. et al. Phillips Technical Review, vol. 38, 1978/79, No. 7/8, pp. 202-210.
Horada, K., Journal of the Electrochemical Society, Solid State Science & Technology, vol. 127, No. 2, 2/1980, pp. 491-497.
Bowers Jr. Charles L.
Goldberg Robert L.
Shipley Company Inc.
LandOfFree
Reticulation resistant photoresist coating does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Reticulation resistant photoresist coating, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reticulation resistant photoresist coating will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1957151