Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-02-08
2005-02-08
Siek, Vuthe (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000
Reexamination Certificate
active
06854106
ABSTRACT:
Reticles having reticle patterns suitable for reducing edge of array effects are provided. The reticle patterns may have sub-resolution patterns or a transmissive block fill formed in the periphery areas of the reticle patterns. Systems incorporating the reticles are also provided. Additionally, methods of forming and using the reticles are provided.
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Baggenstoss William J.
Burgess Byron N.
Byers Erik
Stanton William A.
Dinh Paul
Dinsmore & Shohl LLP
Siek Vuthe
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