Reticles and methods of forming and using the same

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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C716S030000

Reexamination Certificate

active

06854106

ABSTRACT:
Reticles having reticle patterns suitable for reducing edge of array effects are provided. The reticle patterns may have sub-resolution patterns or a transmissive block fill formed in the periphery areas of the reticle patterns. Systems incorporating the reticles are also provided. Additionally, methods of forming and using the reticles are provided.

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