Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-04-18
2006-04-18
Mohamedulla, Saleha R. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C428S014000
Reexamination Certificate
active
07029800
ABSTRACT:
A static resistant reticle comprises a substrate and a patterning layer and is covered by an antistatic conductive film of quaternary amine (R4N)+Cl−. A pellicle structure comprising an optically transparent membrane tightly stretched on a frame is also coated by an antistatic electro conductive film of a similar material. The reticle with the pellicle form a shielded structure isolating the reticle from ESD.
REFERENCES:
patent: 6569576 (2003-05-01), Hsueh et al.
Cheng Dong-Hsu
Su Wei-Yu
Turn Li-Kong
Mohamedulla Saleha R.
Taiwan Semiconductor Manufacturing Co Ltd
Tung & Assoc
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