Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2009-12-16
2010-12-21
Huff, Mark F (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S005000, C430S030000, C430S394000
Reexamination Certificate
active
07855047
ABSTRACT:
A reticle set, includes a first photomask having a circuit pattern provided with first and second openings provided adjacent to each other sandwiching a first opaque portion, and a monitor mark provided adjacent to the circuit pattern; and a second photomask having a trim pattern provided with a second opaque portion covering the first opaque portion in an area occupied by the circuit pattern and an extending portion connected to one end of the first opaque portion and extending outside the area when the second photomask is aligned with a pattern delineated on a substrate by the first photomask.
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Notice of Grounds for Rejection, issued by Japanese Patent Office, mailed Jun. 21, 2005, for Japanese Patent Application No. P2002-352819, and English-language translation thereof.
Asano Masafumi
Fujisawa Tadahito
Tanaka Satoshi
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Huff Mark F
Jelsma Jonathan
Kabushiki Kaisha Toshiba
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