Reticle-masking objective with aspherical lenses

Details Reticle-masking objective with aspherical lenses Reticle-masking objective with aspherical lenses

2006-10-31

2006-10-31

Schwartz, Jordan M. (Department: 2873)

Optical: systems and elements

Lens

With field curvature shaping

C359S656000

Reexamination Certificate

active

07130129

ABSTRACT:
A reticle-masking (REMA) objective for imaging an object plane onto an image plane has a condenser portion, an intermediate portion, and a field lens portion. The three portions together have no more than 10 lenses with a combined total of no more than five aspheric lens surfaces. Each of the three portions of the REMA objective has one or two aspheric lens surfaces.

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N. Nomura et al.; “ArF Quarter-Micron Projection Lithography With an Aspherical Lens System”; Microelectronic Engineering, Apr. 1990, vol. 11; pp. 183-186.

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