Reticle having sub-patterns and a method of exposure using the s

Details Reticle having sub-patterns and a method of exposure using the s Reticle having sub-patterns and a method of exposure using the s

1993-10-08

1995-09-19

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430311, 430394, 430 5, G03C 500

Patent

active

054514886

ABSTRACT:
A method for producing a semiconductor device, includes the steps of: exposing a substrate using a first photomask to form a first chip pattern on the substrate, the first chip pattern being divided into first sub-patterns at a first position on the first photomask so that the first sub-patterns are combined on the substrate and form the first chip pattern; exposing the substrate using a second photomask to form a second chip patterns on the substrate, the second chip pattern being divided into second sub-patterns at a second position on the second photomask so that the second sub-patterns are combined on the substrate and form the second chip pattern; and wherein the second position on the second photomask is different relative to the first position on the first photomask.

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