Reticle for fabricating semiconductor device

Details Reticle for fabricating semiconductor device Reticle for fabricating semiconductor device

1996-04-17

1998-03-31

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, G03F 900

Patent

active

057336903

ABSTRACT:
A reticle for fabricating a semiconductor device, wherein alignment-marks useful to examine a pattern mistake are formed upon a scribe line, the alignment-marks having pairs of adjoining primary and secondary measurement patterns. Each primary measurement pattern includes a rectangular pattern provided on a rectangular plate, and a rod-shaped pattern separately formed along the sides of the rectangular pattern. Each secondary measure pattern is fitted into the rectangular pattern of the respective primary measure pattern in case that the secondary measure pattern is overlapped with the primary measure pattern, to thereby permit the examination of position of the secondary measurement pattern relative to the primary measurement pattern.

REFERENCES:
patent: 5498500 (1996-03-01), Bae

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