Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-08-02
2005-08-02
Whitmore, Stacy A. (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000, C716S030000, C382S144000
Reexamination Certificate
active
06925629
ABSTRACT:
CAD (Computer Aided Design) data which is reticle design data is input to first and second data conversion devices which respectively convert the CAD data to electron beam (EB) write data and inspection data. The EB write data and inspection data output are input to a data verification device to verify whether or not there is a data conversion error. If no data conversion error is detected by the data verification device, an EB writing device writes a pattern on an unwritten reticle with an electron beam based on the EB write data and develops the reticle, after which the fabricated developed reticle is inspected by a reticle inspection device. As a defect, such as a data conversion error contained in EB write data is detected before fabrication of a reticle, the reticle inspection process is simplified, the effective availability factors of the EB writing device and reticle inspection device and the time needed to fabricate a reticle is made shorter, thereby reducing the fabrication cost.
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Bashomatsu Takeshi
Yoshimura Takashi
Lin Sun James
NEC Corporation
Sughrue & Mion, PLLC
Whitmore Stacy A.
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