Reticle alignment and overlay for multiple reticle process

Details Reticle alignment and overlay for multiple reticle process Reticle alignment and overlay for multiple reticle process

2005-05-10

2008-12-16

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S022000, C430S030000, C716S030000, C716S030000, C716S030000

Reexamination Certificate

active

07465525

ABSTRACT:
A method for generating a plurality of reticle layouts is provided. A feature layout with a feature layout pitch is received. A plurality of reticle layouts is generated from the feature layout where each reticle layout of the plurality of reticle layouts has a reticle layout pitch and where each reticle layout pitch is at least twice the feature layout pitch.

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