Retarding electron beams in multiple electron beam pattern...

Details Retarding electron beams in multiple electron beam pattern... Retarding electron beams in multiple electron beam pattern...

2005-08-30

2005-08-30

Vo, Tuyet (Department: 2821)

Electric lamp and discharge devices: systems

High energy particle accelerator tube

C315S506000, C250S310000, C250S492240

Reexamination Certificate

active

06936981

ABSTRACT:
A multiple electron beam pattern generator includes a multiple electron beam source to generate a plurality of electron beams that are modulated according to a pattern. An anode accelerates the electron beams, and then a beam retarding system generates a retarding electric potential about the electron beams to decrease the kinetic energy of the electron beams substantially near a substrate. A beam scanner scans the electron beams across the substrate. A substrate support supports the substrate, and a pattern is generated on the substrate.

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