Abrading – Work holder – Work rotating
Patent
1998-04-14
2000-05-16
Scherbel, David A.
Abrading
Work holder
Work rotating
451 41, 451397, 451288, 451286, B24B 500, B24B 4702
Patent
active
060629630
ABSTRACT:
A chemical-mechanical polishing machine having an improved wafer retainer ring design for the polishing head, comprising a polishing table, a polishing pad, a polishing head and a wafer retainer ring, wherein the polishing pad is above the polishing table, the polishing head is above the polishing pad, and the wafer retainer ring is mounted onto the polishing head. Improvement of the retainer ring design includes the formation of a plurality of guiding holes around the periphery of the retainer ring such that the guiding hole axis follows the centrifugal line produced by a rotating polishing head. Furthermore, the guiding hole has a gradual diffusing structure from the outer inlet to the inner outlet.
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Chiu Hao-Kuang
Lai Chien-Hsin
Lin Juen-Kuen
Peng Peng-Yih
Wu Kun-Lin
Banks Derris H.
Scherbel David A.
United Microelectronics Corp.
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