Restrictor shield having a variable effective throughout area

Details Restrictor shield having a variable effective throughout area Restrictor shield having a variable effective throughout area

1996-03-08

1999-05-11

Ferensic, Denise L.

Pipes and tubular conduits

With flow regulators and/or baffles

Restrictors

138 46, F15D1/02

Patent

active

059017511

ABSTRACT:
Apparatus, positioned at an inlet port to a pump, for shielding the pump from a process chamber of a semiconductor wafer processing system, where the apparatus has a variable effective throughput area. Specifically, the apparatus is a restrictor shield having a first effective throughput area during processing and a second effective throughput area during bakeout, where the first effective throughput area is typically less than the second effective throughput area. The selection of the effective throughput area is directly responsive to the temperature within the process chamber.

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