Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1996-03-15
1998-04-07
Pascal, Robert
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
118723MW, 118728, 156345, 20429815, H05H 146
Patent
active
057368180
ABSTRACT:
A plasma (56, 333) generating apparatus (10, 320, 450) wherein a stage (250, 300, 300A, 350, 400, 425) is constructed to keep the plasma on the substrate (S). A pair of electrically, non-conductive tubes (252, 252A, 303, 305, 303A, 305A 403, 405) are mounted on a conductive base plate (253,306,406) having holes (255, 306B) for gas flow and one of the tubes supports a conductive support plate (251, 301, 351, 401) for a substrate (S). An electrically conductive disk (304, 404) between the tubes is provided. An outer conductive tube (307, 418) is preferably used with larger diameter chambers. The stage is designed to prevent the plasma from falling below conductive support plate which preferably mounts a graphite insert (302, 352, 402) which supports the substrate.
REFERENCES:
patent: 4585668 (1986-04-01), Asmussen
patent: 4630566 (1986-12-01), Asmussen et al.
patent: 4727293 (1988-02-01), Asmussen et al.
patent: 4792772 (1988-12-01), Asmussen
patent: 4906900 (1990-03-01), Asmussen
patent: 4943345 (1990-07-01), Asmussen et al.
patent: 5311103 (1994-05-01), Asmussen
patent: 5382311 (1995-01-01), Ishikawa et al.
patent: 5571577 (1996-11-01), Zhang et al.
Zhang, J., et al., J. Vac. Sci. Technol. A 8 (1990) pp. 2124-2128 No Month.
Asmussen Jes
Reinhard Donnie K.
Ulczynski Michael J.
Bettendorf Justin P.
Board of Trustees operating Michigan State University
McLeod Ian C.
Pascal Robert
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