Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1989-10-20
1992-01-14
LaRoche, Eugene R.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511121, 31511171, 31511181, 31323131, H05H 118
Patent
active
050813986
ABSTRACT:
An improved apparatus for generating a uniform electron cyclotron resonance (ECR) region in a plasma region (16) of a chamber (15) is described. The apparatus uses higher modes of electrical field cusps (16b) which are essentially perpendicular to the magnetic field cusps (16a) in a controlled manner to produce the ECR. The modes are optimal in the ECR region.
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Asmussen Jes
Hopwood Jeffrey A.
Board of Trustees operating Michigan State University
LaRoche Eugene R.
McLeod Ian C.
Yoo Do Hyun
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