Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2007-05-08
2007-05-08
Chiang, Jack (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000
Reexamination Certificate
active
10981343
ABSTRACT:
A method of assigning phases to shifters on a layout is provided. The method includes creating a link between any two shifters within a predetermined distance from each other. In one embodiment, the predetermined distance is larger than a minimum feature size on the layout, and smaller than a combined minimum pitch and regulator width. A weight can be assigned to each created link. Phases can be assigned to the shifters, wherein if a phase-shift conflict exists on the layout, then one or more links can be broken based on their weight.
REFERENCES:
patent: 5302477 (1994-04-01), Dao et al.
patent: 5308741 (1994-05-01), Kemp
patent: 5324600 (1994-06-01), Jinbo et al.
patent: 5364716 (1994-11-01), Nakagawa et al.
patent: 5472814 (1995-12-01), Lin
patent: 5523186 (1996-06-01), Lin et al.
patent: 5527645 (1996-06-01), Pati et al.
patent: 5537648 (1996-07-01), Liebmann et al.
patent: 5538815 (1996-07-01), Oi et al.
patent: 5565286 (1996-10-01), Lin
patent: 5573890 (1996-11-01), Spence
patent: 5595843 (1997-01-01), Dao
patent: 5620816 (1997-04-01), Dao
patent: 5635316 (1997-06-01), Dao
patent: 5636131 (1997-06-01), Liebmann et al.
patent: 5702848 (1997-12-01), Spence
patent: 5761075 (1998-06-01), Oi et al.
patent: 5766804 (1998-06-01), Spence
patent: 5766806 (1998-06-01), Spence
patent: 5807649 (1998-09-01), Liebmann et al.
patent: 5858580 (1999-01-01), Wang et al.
patent: 5867401 (1999-02-01), Haruki
patent: 5923562 (1999-07-01), Liebmann et al.
patent: 5923566 (1999-07-01), Galan et al.
patent: 5994002 (1999-11-01), Matsuoka
patent: 5998068 (1999-12-01), Matsuoka
patent: 6004701 (1999-12-01), Uno et al.
patent: 6057063 (2000-05-01), Liebmann et al.
patent: 6066180 (2000-05-01), Kim et al.
patent: 6083275 (2000-07-01), Heng et al.
patent: 6130012 (2000-10-01), May et al.
patent: 6139994 (2000-10-01), Broeke et al.
patent: 6185727 (2001-02-01), Liebmann
patent: 6228539 (2001-05-01), Wang et al.
patent: 6251549 (2001-06-01), Levenson
patent: 6258493 (2001-07-01), Wang et al.
patent: 6335128 (2002-01-01), Cobb et al.
patent: 6338922 (2002-01-01), Liebmann et al.
patent: 6420074 (2002-07-01), Wang et al.
patent: 6436590 (2002-08-01), Wang et al.
patent: 6485871 (2002-11-01), Kruger et al.
patent: 6493866 (2002-12-01), Mayhew
patent: 6523165 (2003-02-01), Liu et al.
patent: 6584610 (2003-06-01), Wu et al.
patent: 2001/0000240 (2001-04-01), Wang et al.
patent: 2001/0028985 (2001-10-01), Wang et al.
patent: 2002/0081500 (2002-06-01), Cobb et al.
patent: 2002/0083410 (2002-06-01), Wu et al.
patent: 2002/0100005 (2002-07-01), Anderson et al.
patent: 2002/0127479 (2002-09-01), Pierrat
patent: 2002/0129327 (2002-09-01), Pierrat et al.
patent: 2002/0152453 (2002-10-01), Cote et al.
patent: 2002/0155363 (2002-10-01), Cote et al.
patent: 2002/0160278 (2002-10-01), Winder et al.
patent: 2002/0192575 (2002-12-01), Stanton
patent: 195 45 163 (1996-06-01), None
patent: 0 653 679 (1995-05-01), None
patent: 2333613 (1999-07-01), None
patent: 62067547 (1987-03-01), None
patent: 2-140743 (1990-05-01), None
patent: 1283925 (1991-02-01), None
patent: 6-67403 (1994-03-01), None
patent: 8051068 (1996-02-01), None
patent: 8-236317 (1996-09-01), None
patent: 2638561 (1997-04-01), None
patent: 2650962 (1997-05-01), None
patent: 10-133356 (1998-05-01), None
patent: 11-143085 (1999-05-01), None
patent: WO 98/12605 (1998-03-01), None
patent: WO 01/23961 (2001-04-01), None
patent: WO 02/03140 (2002-01-01), None
Ackman, P., et al., “Phase Shifting and Optical Proximity Corrections to Improve CD Control on Logic Devices in Manufacturing for Sub 0.35 um I-Line”, Advance Micro Devices (8 pages).
Matsuoka, K., et al., “Application of Alternating Phase-Shifting Mask to 0.16um CMOS Logic Gate Patterns”, Matsushita Electric Ind. Co., Ltd. (9 pages).
Wang, R., et al., “Plarized Phase Shift Mask: Concept, Design, and Potential Advantages to Photolithography Process and Physical Design”, Motorola Semiconductor Product Sector (12 pages).
Ogawa, K., et al., “Phase Defect Inspection by Differential Interference”, Lasertec Corporation (12 pages).
Pistor, T., “Rigorous 3D Simulation of Phase Defects in Alternating Phase-Shifting Masks”, Panoramic Technology Inc. (13 pages).
Semmier, A., et al., “Application of 3D EMF Simulation for Development and Optimization of Alternating Phase Shifting Masks”, Infineon Technologies AG (12 pages).
Wong, A., et al., “Polarization Effects in Mask Transmission”, University of California Berkeley (8 pages).
Erdmann, A., “Topography Effects and Wave Aberrations in Advanced PSM-Technology”, Fraunhofer Institute of Integrated Circuits (11 pages).
Granik, Y., et al., “CD Variation Analysis Technique and its Application to the Study of PSM Mask Misalignment”. Mentor Graphics (9 pages).
Hanyu, et al., “New Phase-Shifting Mask with Highly Transparent SiO2 Phase Shifters”, Fujitsu Laboratories Ltd. (11 pages).
Ishiwata, N., et al., “Fabrication of Phase-Shifting Mask”, Fujitsu Limited (11 pages).
Levenson, M., et al., “Phase Phirst· An Improved Strong-PSM Paradigm”, M.D. Levenson Consulting, Petersen Advanced Lithography, KLA-Tencor (10 pages).
Levenson, M., et al., “SCAA Mask Exposures and Phase Phirst Design for 110nm Below”. M.D. Levenson Consulting, Canon USA, Inc., JSR Microelectronics, Inc. (10 pages).
Lin, B.J., “The Relative Importance of the Building Blocks for 193 nm Optical Lithography”, Linnovation, Inc. (12 pages).
McCallum, M., et al., “Alternating PSM Mask Performance—a Study of Multiple Fabrication Technique Results”, International SEMATECH (6 pages).
Morikawa, Y., et al., “100nm-alt.PSM Structure Discussion for ArF Lithography”, Dai-Nippon Printing Co., Ltd. (15 pages).
Okazi, T., et al., “A 0.15um KrF Lithography for 1Gb DRAM Product Using Highly Printable Patterns and Thin Resist Process”, Toshiba Corporation (2 pages).
Rhyins, P., et al., “Characterization of Quartz Etched PSM Masks for KrF Lithography at the 100nm Node”, Photronics, Inc., MIT Lincoln Lab; ARCH Chemicals, Finle Technologies, KLATencor Corp. (10 pages).
Rosenbluth, A., et al., “Optimum Mask and Source Patterns to Print a Given Shape”. IBM (17 pages).
Schmidt, R., et al., “Impact of Coma on CD Control for Multiphase PSM Designs”, AMD,ASML (10 pages).
Sewell, H., et al., “An Evaluation of the Dual Exposure Technique”, SVG Lithography Systems Inc. (11 pages).
Spence, C., et al., “Optimization of Phase-Shift Mask Designs Including Defocus Effects”, AMD, Princeton University, Vector Technologies Inc. (8 pages).
Suzuki, A., et al., “Multilevel Imaging System Realizing K1=-.3 Lithography”, Canon Inc. (13 pages).
Vandenberghe, G., et al., “(Sub-) 100nm Gate Patterning Using 248nm Alternating PSM”, IMEC, Mentor Graphics (9 pages).
Fritze, M., et al., “100-nm Node Lithography with KrF?”, MIT Lincoln Lab, Numerical Technologies. Photronics, Arch Chemicals (14 pages).
Fukuda, H., et al., “Patterning of Random Interconnect Using Double Exposure of Strong-Type PSMs”, Hitachi Central Research Lab (8 pages).
Ferguson, R., et al., “Pattern-Dependent Correction of Mask Topography Effects for Alternating Phase-Shifting Masks”, IBM Microelectronics, University of California Berkeley (12 pages).
Toublan, O., et al., “Phase and Transmission Errors Aware OPC Solution for PSM: Feasibility Demonstration”, Mentor Graphics Corp. (7 pages).
Yanagishita, Y., et al., “Phase-Shifting Photolithography Applicable to Real IC Patterns”, Fujitsu Limited (11 pages).
Lovenson, M., et al., “Improving Resolution in Photolithography with a Phase-Shifting Mask”, IEEE, Transactions On Electron Devices, vol. ED-29, No. 12, pp. 1828-1836, Dec. 1982.
Levenson, M., et al., “The Phase-Shifting Mask II: Imaging Simulations and Submicromete
Cho Seonghun
Wang Yao-Ting
Wu Shao-Po
Bever Hoffman & Harms LLP
Chiang Jack
Harms Jeanette S.
Synopsys Inc.
Tat Binh
LandOfFree
Resolving phase-shift conflicts in layouts using weighted... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Resolving phase-shift conflicts in layouts using weighted..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Resolving phase-shift conflicts in layouts using weighted... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3776609