Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1982-02-26
1983-11-08
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430330, 430321, 430324, G03C 500
Patent
active
044143141
ABSTRACT:
Improved resolution in optical lithography, as used in the very large scale integration of electronic circuits, is obtained by employing a thin film of 4-phenylazo-1-naphthylamine between silicon substrate and overlying layer of light sensitive photoresist. The 4-phenylazo-1-naphthylamine acts as a stable, highly light absorbent medium exhibiting chemical and physical compatibility with the silicon substrate and photoresists with ether-type solvent systems.
REFERENCES:
patent: 4023185 (1977-05-01), Bloom et al.
patent: 4328298 (1982-05-01), Nester
patent: 4348471 (1982-09-01), Shelnut et al.
Kaplan Leon H.
Kaplan Richard D.
Zimmerman Steven M.
Bigel Mitchell S.
Dees Jos,e G.
International Business Machines - Corporation
Kittle John E.
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