Semiconductor device manufacturing: process – Semiconductor substrate dicing – Having specified scribe region structure
Patent
1997-05-29
2000-09-19
Dutton, Brian
Semiconductor device manufacturing: process
Semiconductor substrate dicing
Having specified scribe region structure
438977, H01L 2178, H01L 21301, H01L 2146
Patent
active
061211192
ABSTRACT:
The fabrication of a resistor structure is described. A resistive region is formed over the top of a substrate. Trenches are formed from the top side of the substrate in scribe line regions where the wafer is to be separated to form resistor modules. Contact layers are formed over the top side of the substrate and are electrically coupled to each end of the resistive region, respectively. The contact layers are also formed over the sidewalls of the trenches. The wafer is separated through the trenches, creating resistor modules having sidewall contact regions.
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Flores Hector
Richards John G.
ChipScale, Inc.
Dutton Brian
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