Coating apparatus – Gas or vapor deposition – With treating means
Patent
1996-07-01
1997-11-18
Niebling, John
Coating apparatus
Gas or vapor deposition
With treating means
118728, C23C 1600
Patent
active
056883315
ABSTRACT:
In CVD processes susceptors can be made of a thermally conductive ceramic such as aluminum nitride which has superior durability with respect to fluorine plasma. Such aluminum nitride susceptors can include an embedded heater element and/or embedded ground or RF electrodes which as a result of their embedment are protected from the deleterious effects of the processing chamber environment. The conductors leading to these elements are protected from exposure to the process chamber environment by passing through a cylindrical member filled with inert gas supporting the wafer support plate of said susceptor. Alternately, the conductors leading to these elements can be run through passages in a hermetically sealed stem supporting the susceptor wafer support plate. The stem passes through the wall of the processing chamber so that connections to the susceptor wafer support plate can be made outside the processing chamber. Such a stem supporting the susceptor support plate can also provide passages for passing vacuum and purge gas to the back of the wafer support plate. Vacuum and purge gas can then be distributed through passages in the wafer support plate as appropriate to its top surface for a vacuum chuck and perimeter purge gas flow.
REFERENCES:
patent: 5231690 (1993-07-01), Soma et al.
Aruga Michio
DuBois Dale Robert
Morrison Alan Ferris
Ohkura Atsunobu
Saito Akihiko
Applied Materisls, Inc.
Biksa Janis
Chang Joni Y.
Niebling John
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