Resist treating method

Details Resist treating method Resist treating method

1996-02-02

1997-11-11

Pianalto, Bernard

Coating processes

Nonuniform coating

Deforming the base or coating or removing a portion of the...

427384, B05D 300

Patent

active

056861435

ABSTRACT:
There is provided a double-sided substrate cleaning apparatus including a carrier station for loading/unloading a carrier in which objects to be processed are stored, a convey mechanism for conveying an object taken out from the carrier station, at least one cleaning mechanism, arranged along a convey path on which the convey mechanism conveys the object, for cleaning the object, and an object reversing mechanism, arranged along the convey path, for reversing the object.

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