Resist system having increased light response

Details Resist system having increased light response Resist system having increased light response

1981-06-22

1983-02-01

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

156628, 1566591, 156663, 156643, 430313, 430314, 430317, 430323, 430324, 430327, 430328, 430394, 430414, 430416, 430477, 430494, G03C 500, G03C 176

Patent

active

043716083

ABSTRACT:
A chalcogenide such as As.sub.2 S.sub.3 is coated on a substrate at a very low rate of deposition in a vacuum evaporator and is coated with a thin silver layer. The silver coated layer is exposed to illumination in a quantity insufficient to form an etchable layer by conventional techniques and the silver is increased by treatment with a silver-containing agent capable of depositing silver on the image, preferably in the presence of radiation. NaAgSO.sub.3 is a presently preferred agent. The resulting image-bearing layer is photo-doped by exposure to band-gap radiation and the member is then etched.

REFERENCES:
patent: 3933496 (1976-01-01), Kolev et al.
patent: 4127414 (1978-11-01), Yoshikawa et al.
patent: 4269935 (1981-05-01), Masters et al.
patent: 4276368 (1981-06-01), Heller et al.
patent: 4316946 (1982-02-01), Masters et al.

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