Resist stripping

Details Resist stripping Resist stripping

1990-02-01

1992-04-07

Van Le, Hoa

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430326, 430327, 430329, 134 2, 134 3, 134 38, 134 41, 134 42, 252162, G03C 500

Patent

active

051027771

ABSTRACT:
A positive photoresist stripper composition includes a solvent system having solubility parameters which fall within a range from about 8.5 to about 15 in an amount which falls within a range from about 65% to about 98%. An amine is present in an amount which falls within a range from about 2% to about 25%. A fatty acid having 8 to 20 carbon atoms is present in an amount which falls within a range from about 0.1% to about 10% (all percents being by weight). The amount of the amine and of the fatty acid are selected to provide a pH which falls in a range from about 6 to about 9.5. Positive photoresist is stripped from a substrate by immersing the substrate in the aforementioned composition. Metal deposited on the substrate is not attached by the composition.

REFERENCES:
patent: 4130425 (1978-12-01), Boyd
patent: 4744834 (1988-05-01), Haq
patent: 4791043 (1988-12-01), Thomas et al.
patent: 4824763 (1989-04-01), Lee
patent: 4851324 (1989-07-01), Hsieh

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