Resist solution for photolithography including a base resin and

Details Resist solution for photolithography including a base resin and Resist solution for photolithography including a base resin and

1996-03-26

1999-09-14

Nuzzolillo, Maria

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

G03C 173

Patent

active

059521490

ABSTRACT:
A resist solution for photolithography includes a base resin and an oxygen-free or low-oxygen solvent, wherein an oxygen volume in 1 ml of the solution is 0.05 cm.sup.3 or less under atmospheric pressure.

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