Resist remover composition

Details Resist remover composition Resist remover composition

2005-03-01

2005-03-01

Le, Hoa Van (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

Reexamination Certificate

active

06861210

ABSTRACT:
The present invention relates to a resist remover composition for removing resists during manufacturing processes of semiconductor devices such as integrated circuits, large scale integrated circuits and very large scale integrated circuits. The composition comprises a) 10 to 40 wt. % of water-soluble organic amine compound, b) 10 to 60 wt. % of water-soluble polar organic solvent, c) 10 to 30 wt. % of water, and d) 0.1 to 10 wt. % of organic phenol compound containing two or more hydroxyl groups, and it is characterized in that the water-soluble polar organic solvent is 2-hydroxyisobutyric acid methylester (HBM).

REFERENCES:
patent: 4617251 (1986-10-01), Sizensky
patent: 4770713 (1988-09-01), Ward
patent: 5612303 (1997-03-01), Takayanagi et al.
patent: 3828513 (1990-03-01), None
patent: 1 016 699 (2000-07-01), None
patent: 63-208043 (1988-08-01), None
patent: 63-231343 (1988-09-01), None
patent: 64-042653 (1989-02-01), None
patent: 04-124668 (1992-04-01), None
patent: 04-289866 (1992-10-01), None
patent: 04-350660 (1992-12-01), None
patent: 05-281753 (1993-10-01), None
patent: 06184595 (1994-07-01), None
patent: 06-249355 (1994-09-01), None
patent: 06-266119 (1994-09-01), None
patent: 07-069618 (1995-04-01), None
patent: 08-123043 (1996-05-01), None
patent: 08-262746 (1996-10-01), None
patent: 09-096911 (1997-04-01), None
patent: 09-152721 (1997-06-01), None

Affiliated with

Also associated with

Rating

Resist remover composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Resist remover composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Resist remover composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3443797