Resist protective coating material and patterning process

Details Resist protective coating material and patterning process Resist protective coating material and patterning process

2006-07-26

2009-08-04

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S330000, C430S905000, C430S907000, C430S910000, C526S281000, C526S284000

Reexamination Certificate

active

07569323

ABSTRACT:
A resist protective coating material is provided comprising an α-trifluoromethylacrylic acid
orbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography.

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Soichi Owa et al.; “Immersion lithography; its potential performance and issues”, Proceedings of SPIE, vol. 5040, pp. 724-733; 2003. Cited in the specification.
Taku Hirayama; “Resist and Cover Material Investigation for Immersion Lithography”; 2nd. Immersion Workshop, Jul. 11, 2003. Cited in the specification.
Robert D. Allen et al.; “Design of Protective Topcoats for Immersion Lithography”; Journal of Photopolymer Science and Technology, vol. 18, No. 5, pp. 615-619, 2005.

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