Resist processing method and resist processing system

Details Resist processing method and resist processing system Resist processing method and resist processing system

1997-09-11

1999-02-02

Le, Hoa Van

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Processing feature prior to imaging

430311, 430319, 430325, G03C 529

Patent

active

058663070

ABSTRACT:
A resist processing method for introducing a pressurized gas into a vessel storing a solution, sending the solution from the vessel to a nozzle by way of a supply line by means of the pressurized gas, and supplying the solution from the nozzle to a substrate.

REFERENCES:
patent: 5374312 (1994-12-01), Hasebe et al.
Patent Abstracts of Japan, vol. 96, No. 10, Oct. 31, 1996, JP 08-153675, Jun. 11, 1996.
Patent Abstracts of Japan, vol. 96, No. 2, Feb. 29, 1996, JP 7-283184, Oct. 27, 1995.
Patent Abstracts of Japan, vol. 97, No. 5, May 30, 1997, JP 9-007936, Jan. 10, 1997.

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