Resist processing method

Material or article handling – Apparatus particularly adapted for charging or discharging a... – With means to transfer – or facilitate transfer of – vehicle...

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Details

354325, 414416, 414225, G03D 500

Patent

active

054424160

ABSTRACT:
A resist process system of the present invention includes at least two robots for conveying a wafer, a passage through which the robots can move, plural process units arranged along the passage, and a waiting unit for temporarily holding the wafer which is to be processed. The waiting unit is arranged beside the passage and between the process units and it includes plural compartments partitioned in it.

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patent: 5339128 (1994-08-01), Tateyama et al.

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